Erica L Rausch

Title: Innovations by Erica L Rausch

Introduction

Erica L Rausch is a prominent inventor based in Austin, TX (US). She has made significant contributions to the field of materials science, particularly in the development of advanced thin films and block copolymers. With a total of 5 patents to her name, her work has implications for lithographic patterning and nanostructured materials.

Latest Patents

One of her latest patents is titled "Using chemical vapor deposited films to control domain orientation in block copolymer thin films." This innovation involves the use of vacuum-deposited thin films to create an interface that interacts non-preferentially with different domains of an underlying block copolymer film. The non-preferential interface prevents the formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.

Another significant patent is "Anhydride copolymer top coats for orientation control of thin film block copolymers." This concept involves the use of random copolymer top coats that can be spin-coated onto block copolymer thin films to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. These top coats potentially allow for the facile orientation control of block copolymers, which would otherwise be quite challenging.

Career Highlights

Erica L Rausch is affiliated with the University of Texas System, where she continues to advance her research in materials science. Her innovative work has garnered attention in both academic and industrial circles, contributing to the development of new technologies in the field.

Collaborations

Some of her notable coworkers include Christopher John Ellison and Julia Cushen, who have collaborated with her on various projects related to thin films and block copolymers.

Conclusion

Erica L Rausch is a leading inventor whose work in the field of materials science has led to significant advancements in the control of block copolymer thin films.