The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2018
Filed:
Aug. 28, 2015
Board of Regents the University of Texas System, Austin, TX (US);
C. Grant Willson, Austin, TX (US);
Christopher John Ellison, Austin, TX (US);
Takehiro Sleshimo, Austin, TX (US);
Julia Cushen, Austin, TX (US);
Christopher M. Bates, Austin, TX (US);
Leon Dean, Spokane, WA (US);
Logan J. Santos, Austin, TX (US);
Erica L. Rausch, Austin, TX (US);
Board of Regents The University of Texas System, Austin, TX (US);
Abstract
The concepts described herein involve the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.