Company Filing History:
Years Active: 2018
Title: Takehiro Sleshimo: Innovator in Copolymer Technology
Introduction
Takehiro Sleshimo is a notable inventor based in Austin, TX. He has made significant contributions to the field of materials science, particularly in the development of advanced copolymer technologies. His innovative work has implications for various applications, including lithography and thin film technologies.
Latest Patents
Takehiro Sleshimo holds a patent for "Anhydride copolymer top coats for orientation control of thin film block copolymers." This patent describes the use of random copolymer top coats that can be spin coated onto block copolymer thin films. These top coats are designed to control the interfacial energy of the top coat-block copolymer interface. They are soluble in aqueous weak base and can change surface energy once deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. The top coats potentially allow for the facile orientation control of block copolymers, which would otherwise be quite challenging.
Career Highlights
Takehiro Sleshimo is affiliated with the University of Texas System, where he continues to advance research in polymer science. His work has garnered attention for its innovative approach to controlling the properties of thin films, which is crucial for various technological applications.
Collaborations
Some of his notable coworkers include C Grant Willson and Christopher John Ellison. Their collaborative efforts contribute to the advancement of research in the field of materials science.
Conclusion
Takehiro Sleshimo's contributions to copolymer technology exemplify the innovative spirit of modern science. His work not only enhances our understanding of materials but also paves the way for future advancements in various applications.