The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Apr. 28, 2015
Board of Regents, the University of Texas System, Austin, TX (US);
C. Grant Wilson, Austin, TX (US);
William J. Durand, Austin, TX (US);
Christopher John Ellison, Austin, TX (US);
Christopher M. Bates, Austin, TX (US);
Takehiro Seshimo, Austin, TX (US);
Julia Cushen, Austin, TX (US);
Logan J. Santos, Austin, TX (US);
Leon Dean, Spokane, WA (US);
Erica L. Rausch, Austin, TX (US);
Board of Regents, The University of Texas System, Austin, TX (US);
Abstract
Vacuum deposited thin films of material are used to create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. The non-preferential interface prevents formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nano structured features in a block copolymer film that can serve as lithographic patterns.