Company Filing History:
Years Active: 2015-2019
Title: William J Durand: Innovator in Block Copolymer Thin Films
Introduction
William J Durand is a notable inventor based in Austin, TX (US). He has made significant contributions to the field of materials science, particularly in the development of block copolymer thin films. With a total of 2 patents, his work has implications for various applications in nanotechnology and lithography.
Latest Patents
Durand's latest patents focus on the use of chemical vapor deposited films to control domain orientation in block copolymer thin films. These vacuum deposited thin films create an interface that non-preferentially interacts with different domains of an underlying block copolymer film. This non-preferential interface prevents the formation of a wetting layer and influences the orientation of domains in the block copolymer. The purpose of the deposited polymer is to produce nanostructured features in a block copolymer film that can serve as lithographic patterns.
Career Highlights
Durand is affiliated with the University of Texas System, where he continues to advance research in his field. His innovative approaches have garnered attention and recognition within the scientific community.
Collaborations
Some of his notable coworkers include Christopher John Ellison and Christopher M Bates. Their collaborative efforts contribute to the ongoing research and development in materials science.
Conclusion
William J Durand's work in the field of block copolymer thin films showcases his innovative spirit and dedication to advancing technology. His contributions are paving the way for future developments in nanotechnology and lithography.