Sunnyvale, CA, United States of America

Emi Ishida


Average Co-Inventor Count = 2.2

ph-index = 13

Forward Citations = 766(Granted Patents)


Company Filing History:


Years Active: 1998-2004

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38 patents (USPTO):Explore Patents

Title: Emi Ishida: Innovator in Semiconductor Technology

Introduction: Emi Ishida, based in Sunnyvale, CA, has established a remarkable career as an inventor, holding an impressive 38 patents. His contributions have significantly shaped the landscape of semiconductor technology, focusing on methods that enhance the efficiency and performance of various semiconductor devices.

Latest Patents: Among his latest inventions, Emi Ishida has developed a method for ion implantation with improved ion source life expectancy. This innovative approach utilizes the introduction of inert gases, such as argon or xenon, into halide-containing source gases, resulting in enhanced sputtering and increased ion source lifetime in ion implantation systems. Additionally, he has created a semiconductor processing technique employing semiconducting sidewall spacers, which are essential in the formation of source/drain regions. These spacers minimize the risk of suicide shorting through shallow source/drain junctions and can be doped to serve as a source of impurities for forming source/drain extensions during activation annealing.

Career Highlights: Emi Ishida's career includes significant tenure at Advanced Micro Devices Corporation, where he contributed to the development of groundbreaking semiconductor solutions. His extensive experience and patent portfolio underscore his expertise and innovation in the field.

Collaborations: Throughout his career, Emi has collaborated with esteemed colleagues, including Ming Yin Hao and Effiong Etukudo Ibok. These partnerships have fostered a collaborative environment that further fuels innovation in semiconductor technology.

Conclusion: Emi Ishida’s impressive record of 38 patents highlights his dedication and impact on semiconductor innovations. His latest contributions demonstrate a continuous pursuit of advancements that improve device performance and reliability, solidifying his reputation as a leading inventor in the field.

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