Kunitachi, Japan

Eisaku Oho

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2015.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eisaku Oho. Retrieved from https://idiyas.com/inventor/eisaku-oho

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2015

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovations of Eisaku Oho

Introduction

Eisaku Oho is a notable inventor based in Kunitachi, Japan. He has made significant contributions to the field of charged particle microscopy. His work has led to advancements in image processing techniques that enhance the quality of images obtained through this technology.

Latest Patents

Eisaku Oho holds a patent for a "Charged Particle Beam Apparatus." This invention involves a signal processing unit that calculates a degradation function of an image based on detection signals obtained by scanning a charged particle beam at two different scanning speeds. The innovation includes creating a one-dimensional correction filter to recover image quality, which is applied to detection signals recorded at higher scanning speeds.

Career Highlights

Oho is associated with Hitachi High-Technologies Corporation, where he has been instrumental in developing advanced technologies in microscopy. His expertise in signal processing and image enhancement has positioned him as a key figure in his field.

Collaborations

Eisaku Oho has collaborated with notable colleagues such as Yoshinobu Hoshino and Shigeru Kawamata. Their combined efforts have contributed to the advancement of technologies in charged particle microscopy.

Conclusion

Eisaku Oho's innovative work in charged particle beam technology exemplifies the impact of dedicated inventors in advancing scientific research and technology. His contributions continue to influence the field of microscopy and image processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…