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For the Inventor, By the Inventor

Hitachi, Japan

Eiji Setoyama

This inventor holds 13 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1987-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Eiji Setoyama. Retrieved from https://idiyas.com/inventor/eiji-setoyama

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 13

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 8

Forward Citations = 255(Granted Patents)


Company Filing History:

goldMedal13 out of 42,726 
 
Hitachi, Ltd.
 patents

Years Active: 1987-2001

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13 patents (USPTO):Explore Patents
1. 6224676 - Gas supply apparatus and film forming apparatus (2001-05-01),
2. 6196155 - Plasma processing apparatus and method of cleaning the apparatus (2001-03-06),
3. 6084356 - Plasma processing apparatus with a dielectric body in the waveguide (2000-07-04),
4. 5783055 - Multi-chamber sputtering apparatus (1998-07-21),
5. 5429729 - Sputtering apparatus, device for exchanging target and method for the (1995-07-04),
6. 5376777 - Control apparatus and method for a substrate tray on an in-line (1994-12-27),
7. 5116482 - Film forming system using high frequency power and power supply unit for (1992-05-26),
8. 5085755 - Sputtering apparatus for forming thin films (1992-02-04),
9. 5061356 - Vacuum treatment apparatus and vacuum treatment method (1991-10-29),
10. 4986890 - Thin film deposition system (1991-01-22),
11. 4911815 - Sputtering apparatus for production of thin films of magnetic materials (1990-03-27),
12. 4865709 - Magnetron sputter apparatus and method for forming films by using the (1989-09-12),
13. 4673482 - Sputtering apparatus (1987-06-16),

Title: Eiji Setoyama: Innovator in Plasma Processing Technology

Introduction

Eiji Setoyama is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 13 patents. His innovative work has led to advancements in gas supply apparatus and plasma processing methods.

Latest Patents

Among his latest patents are a gas supply apparatus and a film forming apparatus. The gas supply apparatus features a signal transmission system arranged in a region surrounded by gas control means and multiple blocks. This design allows for the utilization of space between elements in the gas supply flow path, effectively miniaturizing the apparatus. Additionally, his plasma processing apparatus includes a plasma generating chamber with a unique arrangement of magnets that form a cusped magnetic field, which confines plasma effectively. This apparatus also incorporates a holding device for substrates to be processed, showcasing his innovative approach to plasma technology.

Career Highlights

Eiji Setoyama has dedicated his career to advancing technology at Hitachi, Ltd. His work has not only contributed to the company's reputation but has also pushed the boundaries of what is possible in plasma processing and gas supply systems.

Collaborations

Throughout his career, Setoyama has collaborated with notable colleagues, including Mitsuhiro Kamei and Hirofumi Seki. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies.

Conclusion

Eiji Setoyama's contributions to plasma processing technology and gas supply systems have established him as a leading inventor in his field. His innovative patents and collaborative efforts continue to influence advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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