Tokyo, Japan

Eiji Hirai

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.1

ph-index = 3

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 1992-2020

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5 patents (USPTO):Explore Patents

Title: Eiji Hirai: A Pioneer in Substrate Cleaning Technology

Introduction

Eiji Hirai, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of substrate cleaning technology. With a remarkable portfolio of five patents, his work focuses on advancing cleaning apparatus and methodologies that are critical in various manufacturing processes.

Latest Patents

Hirai's latest innovations include a range of patents such as the substrate cleaning device, substrate cleaning apparatus, method for manufacturing cleaned substrate, and substrate processing apparatus. His substrate cleaning device features a substrate holding unit designed to securely hold a substrate while employing two cleaning units. The first and second cleaning units each consist of a cleaning member that can contact the substrate's surface, effectively maintaining cleanliness and ensuring high efficiency in production environments. The unique controller system manages these cleaning units, allowing for a seamless operation where only one cleaning member is in action at a time to avoid interfering with the substrate.

Career Highlights

Throughout his career, Eiji Hirai has collaborated with well-respected companies such as Nihon Parkerizing Co., Ltd. and Ebara Corporation. His work at these organizations has enabled the development of innovative technologies that enhance manufacturing processes, particularly in industries requiring precision and cleanliness.

Collaborations

Hirai has also worked alongside esteemed colleagues like Takeshi Sakurai and Kaoru Hamaura. Their combined expertise has further propelled advancements in substrate cleaning technologies, fostering an environment of creativity and ingenuity.

Conclusion

Eiji Hirai continues to be a vital force in the field of innovations related to substrate cleaning. His consistent commitment to improving cleaning methods and apparatus demonstrates his importance as an inventor, and his patents will likely influence future developments within the industry. His contributions are a testament to the ongoing evolution of technology, particularly in the realm of manufacturing and production efficiency.

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