Edwin R Jones

Title: Edwin R. Jones: A Pioneer in Proximity Correction Technologies

Introduction

Edwin R. Jones, based in Sunnyvale, California, is a notable inventor with a remarkable portfolio of 43 patents to his name. His innovative contributions, particularly in the field of proximity correction technologies, have significantly advanced the methods used in mask pattern applications, enhancing precision in various engineering and manufacturing processes.

Latest Patents

Among his latest patents, two stand out for their applications in proximity correction:

1. **Method and apparatus for application of proximity correction with relative segmentation** - This invention outlines a technique for applying one-dimensional proximity correction to mask patterns by segmenting a mask into multiple segments, thus improving accuracy by considering interactions between segments.

2. **Method and apparatus for application of proximity correction with unitary segmentation** - This patent focuses on applying proximity correction to individual segments of a mask pattern independently, allowing for more straightforward adjustments and optimizations without the need for cross-segment considerations.

Career Highlights

Edwin R. Jones has made significant strides in his career while working with LSI Logic Corporation. His expertise and innovative mindset have been crucial in developing technologies that optimize manufacturing processes, particularly in the semiconductor industry. Through his dedicated work, he has established himself as an expert in the manipulation and correction of mask patterns, which is vital for the production of high-precision electronic components.

Collaborations

Throughout his career, Edwin has collaborated with talented peers, including Ranko L. Scepanovic and James S. Koford. This teamwork exemplifies the collaborative nature of innovation in the tech industry, where combining diverse expertise often leads to groundbreaking developments.

Conclusion

Edwin R. Jones's extensive portfolio and recent advancements in proximity correction methods showcase his crucial role as an inventor in the technology sector. His work not only furthers the capabilities of semiconductor manufacturing but also inspires future innovations in the field. The impact of his patents will likely continue to influence engineering practices for years to come.