The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2001
Filed:
Mar. 03, 1998
Ranko Scepanovic, San Jose, CA (US);
Dusan Petranovic, Cupertino, CA (US);
Edwin Jones, Los Altos, CA (US);
Richard Schinella, Saritoga, CA (US);
Nicholas F. Pasch, Pacifica, CA (US);
Mario Garza, Sunnyvale, CA (US);
Keith K. Chao, San Jose, CA (US);
John V. Jensen, Fremont, CA (US);
Nicholas K. Eib, San Jose, CA (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
The present invention is a method and apparatus for systematically applying proximity corrections to a mask pattern, wherein the pattern is divided into a grid of equally sized grid rectangles, an inner rectangle comprising a plurality of grid rectangles is formed, an outer rectangle comprising a second plurality of grid rectangles and the inner rectangle is formed and proximity correction is applied to the pattern contained within the inner rectangle as a function of the pattern contained within the outer rectangle.