The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2001
Filed:
Mar. 03, 1998
Dusan Petranovic, Cupertino, CA (US);
Ranko Scepanovic, San Jose, CA (US);
Edwin Jones, Los Altos, CA (US);
Richard Schinella, Saritoga, CA (US);
Nicholas F. Pasch, Pacifica, CA (US);
Mario Garza, Sunnyvale, CA (US);
Keith K. Chao, San Jose, CA (US);
John V. Jensen, Fremont, CA (US);
Nicholas K. Eib, San Jose, CA (US);
LSI Logic Corporation, Milpitas, CA (US);
Abstract
The present invention is a method and apparatus for applying one-dimensional proximity correction to a piece of a mask pattern, by segmenting a first piece of a mask pattern with horizontal dividing lines into a plurality of segments, segmenting a second piece of said mask pattern with said horizontal dividing lines into a second plurality of segments, and applying proximity correction to a first segment from said first plurality of segments taking into consideration a second segment from said second plurality of segments.