Edwin A Arevalo

Title: Edwin A Arevalo: Innovator in Ion Implantation Technology

Introduction

Edwin A Arevalo is a notable inventor based in Haverhill, MA (US). He has made significant contributions to the field of ion implantation technology, holding a total of 6 patents. His work focuses on enhancing the efficiency and effectiveness of ion implantation processes.

Latest Patents

One of Edwin's latest patents is titled "System and technique for profile modulation using high tilt angles." This innovative system allows for higher energy implants to be performed, where the peak concentration depth is shallower than would typically occur. The system includes an ion source, an accelerator, a platen, and a platen orientation motor that enables large tilt angles. This capability allows for the implantation of hydrogen ions at energies of up to 5 MeV. By tilting the workpiece during the implant, the system can achieve results typically associated with lower energy implants. Additionally, the resistivity profile of the workpiece after thermal treatment closely resembles that achieved using a lower energy implant. In certain embodiments, the peak concentration depth can be reduced by 3 µm or more through the use of larger tilt angles.

Another significant patent involves "Techniques for forming low stress mask using implantation." This method includes depositing a mask layer on a substrate via physical vapor deposition, where the stress in the mask layer has a first value. By directing a dose of ions into the mask layer, the stress value is reduced to a second value that is less than the first. This innovative approach enhances the performance and reliability of the mask layer.

Career Highlights

Edwin A Arevalo has worked with prominent companies in the semiconductor industry, including Varian Semiconductor Equipment Associates, Inc. and Applied Materials, Inc. His experience in these organizations has contributed to his expertise in ion implantation technology and innovation.

Collaborations

Throughout his career, Edwin has collaborated with talented individuals such as Jonathan Gerald England and Rajesh Prasad. These collaborations have further enriched his work and contributed to advancements in the field.

Conclusion

Edwin A Arevalo is a distinguished inventor whose work in ion implantation technology has led to significant advancements in the field. His innovative patents and career achievements reflect his dedication to improving semiconductor processes. His contributions continue to influence the industry and inspire future innovations.