Edward R Engbrecht

Title: Edward R Engbrecht: Innovator in Semiconductor Technology

Introduction

Edward R Engbrecht is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on improving the fabrication processes of semiconductor wafers, which are crucial for modern electronic devices.

Latest Patents

Engbrecht's latest patents include innovative methods for controlling stress in semiconductor wafers. One of his notable inventions is the "Wafer stress control with backside patterning." This invention provides structures and methods for managing stress during wafer fabrication. By creating a corresponding pattern of dummy deep trenches on the back side of the wafer, Engbrecht's method helps balance the stresses on both sides, reducing issues such as warping.

Another significant patent is the "Bilayer trench first hardmask structure and process for reduced defectivity." This invention outlines a method for transferring a lithographic pattern into a substrate. It involves forming multiple hardmask layers to ensure precise pattern transfer, which is essential for reducing defects in semiconductor manufacturing.

Career Highlights

Throughout his career, Engbrecht has worked with prominent companies in the technology sector. He has been associated with International Business Machines Corporation (IBM) and Globalfoundries Inc., where he has contributed to advancements in semiconductor technology.

Collaborations

Engbrecht has collaborated with talented individuals in his field, including Hakeem B S Akinmade-Yusuff and Samuel Sung Shik Choi. These collaborations have further enhanced his innovative work in semiconductor fabrication.

Conclusion

Edward R Engbrecht is a distinguished inventor whose contributions to semiconductor technology have made a significant impact on the industry. His innovative patents and collaborations reflect his commitment to advancing the field.