Eddy Kunnen

Title: Eddy Kunnen: Innovator in Semiconductor Technology

Introduction

Eddy Kunnen is a prominent inventor based in Kessel-lo, Belgium. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on innovative methods for enhancing the fabrication processes of semiconductor devices.

Latest Patents

Eddy Kunnen's latest patents include a method for protecting a substrate region during the fabrication of a field-effect transistor (FET) sensor. This method involves providing a substrate with a gate dielectric and a sacrificial element, followed by the formation of layers over the sacrificial element. The process allows for the selective removal of the sacrificial element through oxidation, thereby creating a sensor cavity. Another notable patent is a method for blocking a trench portion during the manufacture of a semiconductor structure. This method includes forming a stack with a hard mask and a first coating, followed by etching and filling processes that ensure the integrity of the trench during manufacturing.

Career Highlights

Eddy Kunnen has worked with leading organizations in the semiconductor industry, including the Interuniversity Microelectronics Centre (imec) and Imec Vzw. His experience in these institutions has allowed him to develop and refine his innovative techniques in semiconductor fabrication.

Collaborations

Throughout his career, Eddy has collaborated with notable professionals in the field, including Serge Vanhaelemeersch and Laure Elisa Carbonell. These collaborations have contributed to the advancement of semiconductor technologies and the successful implementation of his patented methods.

Conclusion

Eddy Kunnen's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence the development of advanced semiconductor devices.