Eberhard Kuehn is a notable inventor based in Hemhofen, Germany. He has made significant contributions to the field of photoresist technology, holding a total of 10 patents. His work has been instrumental in advancing the methods used in the semiconductor industry.

Latest Patents

Kuehn's latest patents include a photoresist compound and method for structuring a photoresist layer. This innovative photoresist composition achieves uniform volume growth in a chemical expansion on a chemically expandable photomask. The composition consists of a film-forming polymer that can be converted into alkali-soluble groups through acid-catalyzed separation reactions. Additionally, it includes a photoacid generator that releases an acid upon exposure to radiation and a thermoacid generator that releases an acid when supplied with sufficient thermal energy. Another significant patent involves the preparation of poly-o-hydroxyamides and poly-o-mercaptoamides, where a bis-o-aminophenol or a bis-o-aminothiophenol is reacted with a dicarboxylic acid derivative.

Career Highlights

Throughout his career, Kuehn has worked with prominent companies such as Siemens Aktiengesellschaft and Infineon Technologies AG. His experience in these organizations has allowed him to develop and refine his innovative ideas in the field of photoresist technology.

Collaborations

Kuehn has collaborated with notable colleagues, including Hellmut Ahne and Recai Sezi. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Eberhard Kuehn's contributions to photoresist technology and his impressive portfolio of patents highlight his role as a leading inventor in the field. His work continues to influence advancements in semiconductor manufacturing processes.

Profile summary based on public USPTO records.

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