The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Apr. 26, 2002
Gertrud Falk, Erlangen, DE;
Eberhard Kuehn, Hemhofen, DE;
Ernst Christian Richter, Erlangen-Bruck, DE;
Michael Sebald, Weisendorf, DE;
Gertrud Falk, Erlangen, DE;
Eberhard Kuehn, Hemhofen, DE;
Ernst Christian Richter, Erlangen-Bruck, DE;
Michael Sebald, Weisendorf, DE;
Infineon Technology AG, Munich, DE;
Abstract
A photoresist compound or composition achieves a uniform volume growth in a chemical expansion on a chemically expandable photomask during a method for structuring a layer of the photoresist compound. The photoresist composition comprises a film-forming polymer having molecular groups that can be converted into alkali-soluble groups through acid-catalyzed separation reactions, and reactive molecular groups that can react with an expansion component so as to form a chemical bond. In addition, the photoresist composition comprises a photoacid generator that releases an acid upon exposure with radiation from a suitable wavelength range, and a thermoacid generator that releases an acid when supplied with sufficient thermal energy.