Eberhard Kühn

Title: Eberhard Kühn: Innovator in Photolithography

Introduction

Eberhard Kühn is a notable inventor based in Hemhofen, Germany. He has made significant contributions to the field of photolithography, holding a total of 4 patents. His work focuses on enhancing the performance and efficiency of photoresists used in various applications.

Latest Patents

Kühn's latest patents include a silicon-containing resist for photolithography. This innovative photoresist features a polymer with a main chain composed of alternating silicon and oxygen atoms, along with a side chain made of carbon atoms. The carbon chain includes acid-labile groups, allowing the photoresist to function as a chemically amplified photoresist. Another significant patent involves a process for increasing the etch resistance and reducing the hole and trench width of a photoresist structure. This process utilizes solvent systems of low polarity, which enhance the etch resistance and allow for adjustments in the structure size of the resist, even in ultrathin layers.

Career Highlights

Eberhard Kühn is currently associated with Infineon Technologies AG, where he continues to innovate in the field of semiconductor technology. His expertise in photolithography has positioned him as a key player in advancing the capabilities of photoresists.

Collaborations

Kühn has collaborated with several professionals in his field, including Jörg Rottstegge and Waltraud Herbst. These collaborations have contributed to the development of cutting-edge technologies in photolithography.

Conclusion

Eberhard Kühn's contributions to photolithography and his innovative patents demonstrate his commitment to advancing technology in this field. His work continues to influence the development of more efficient and effective photoresists.