This inventor holds 5 USPTO granted patents. Top assignee: Novellus Systems Incorporated. Active years: 2001-2004.
Location History:
- Sunnyvale, CA (US) (2001 - 2003)
- Franklin, MA (US) (2002 - 2004)
Company Filing History:
Years Active: 2001-2004
Title: E Derryck Settles: Innovator in Metal Alloy Deposition Technologies
Introduction
E Derryck Settles is a notable inventor based in Franklin, MA (US), recognized for his contributions to the field of integrated circuit metallization. With a total of 5 patents, Settles has made significant advancements in the production of multi-component metal alloy films.
Latest Patents
One of his latest patents is a sputter apparatus for producing multi-component metal alloy films and the method for making the same. This invention features a mosaic or inlaid sputter target design that is suitable for various deposition techniques, including conventional planar magnetron deposition and RF ionized physical vapor deposition. The design allows for uniform deposition of films on semiconductor substrates, utilizing inlays shaped as wedges, wires, or buttons. This innovation leads to the production of various alloy films, including CuAl, CuBe, and CuZn, among others. Another significant patent involves high magnesium content copper magnesium alloys as diffusion barriers. This invention simplifies the process of producing a diffusion barrier and a seed layer by depositing copper-magnesium alloys with high levels of magnesium, which self-form a magnesium oxide barrier layer at the substrate interface.
Career Highlights
E Derryck Settles has built a successful career at Novellus Systems Incorporated, where he has been instrumental in developing advanced technologies for semiconductor manufacturing. His work has contributed to the efficiency and effectiveness of integrated circuit production.
Collaborations
Settles has collaborated with notable colleagues, including Ronald Allan Powell and Sridhar Karthik Kailasam, to further enhance the innovations in his field.
Conclusion
E Derryck Settles continues to be a driving force in the development of metal alloy deposition technologies, significantly impacting the semiconductor industry with his innovative patents and collaborative efforts.