Lincoln, NE, United States of America

Duane E Meyer

USPTO Granted Patents = 10 

Average Co-Inventor Count = 2.7

ph-index = 6

Forward Citations = 328(Granted Patents)


Company Filing History:


Years Active: 1997-2023

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10 patents (USPTO):Explore Patents

Title: Duane E Meyer: Innovator in Electromagnetic Measurement Systems

Introduction

Duane E Meyer is a prominent inventor based in Lincoln, NE (US), known for his significant contributions to the field of electromagnetic measurement systems. With a total of 10 patents to his name, Meyer has developed advanced technologies that enhance the precision and functionality of various optical instruments.

Latest Patents

Meyer’s latest patents include a Reflectometer, Spectrophotometer, Ellipsometer, and Polarimeter system that utilizes a supercontinuum laser source. This innovative system generates a beam of electromagnetic radiation across a wide range of wavelengths, from 400 nm to 50000 nm. The design incorporates a stage for supporting samples and a sophisticated detector system that can be optimized with combinations of gratings and dichroic beam splitter-prisms. This allows for precise wavelength dispersion and detection. Additionally, he has developed beam focusing and reflecting optics that minimize aberration and diffraction effects, ensuring optimal performance in ellipsometer and polarimeter systems.

Career Highlights

Throughout his career, Duane E Meyer has worked with notable companies such as J.A. Woollam Co. and J.A. Woollam Co., Inc. His work has significantly impacted the development of optical measurement technologies, making them more efficient and accurate.

Collaborations

Meyer has collaborated with esteemed colleagues, including Martin M Liphardt and Blaine D Johs, contributing to advancements in the field through shared expertise and innovative ideas.

Conclusion

Duane E Meyer stands out as a key figure in the realm of electromagnetic measurement systems, with a robust portfolio of patents that reflect his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future developments in optical instrumentation.

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