Bridge of Weir, United Kingdom

Douglas Holmes


Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 62(Granted Patents)


Location History:

  • Bridge of Weir, GB (2004 - 2007)
  • San Ramon, CA (US) (2008)

Company Filing History:


Years Active: 2004-2008

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4 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Douglas Holmes

Introduction

Douglas Holmes, an inventor based in Bridge of Weir, Great Britain, has made significant strides in the field of semiconductor cleaning technologies. With a total of four patents to his name, Holmes has developed solutions that enhance the efficiency and effectiveness of cleaning semiconductor devices.

Latest Patents

Holmes' most recent inventions showcase his expertise in creating compositions for cleaning organic and plasma etched residues from semiconductor devices. One of his notable patents involves a composition for stripping photoresist and cleaning residues from substrates. This innovative formulation includes fluoride compounds, sulfoxide or sulfone solvents, and water, combined in specific weight percentages. Additionally, it may incorporate corrosion inhibitors and surfactants, demonstrating Holmes’ understanding of complex chemical interactions.

Another significant patent focuses on aqueous phosphoric acid compositions designed for cleaning semiconductor devices. This invention pertains to dilute aqueous solutions containing phosphoric acid, aimed at effectively removing plasma etch residues. It may include various beneficial components such as alkaline compounds and organic solvents, highlighting Holmes' ability to devise practical solutions for the semiconductor industry.

Career Highlights

Holmes’ career is marked by his continued commitment to innovation in semiconductor cleaning technology, making him a vital contributor to his field. His work has not only advanced the cleaning processes within the industry but has also shown a dedication to finding safer and more effective chemical compositions.

Collaborations

Throughout his career, Douglas Holmes has collaborated with esteemed colleagues, including Jerome Daviot and Robert J. Small. These collaborations have facilitated the development of innovative technologies and fostered a culture of creativity and teamwork in addressing the challenges in semiconductor manufacturing.

Conclusion

In conclusion, Douglas Holmes stands out as a prominent inventor whose contributions to semiconductor cleaning technology are noteworthy. His innovative patents are critical to enhancing device manufacturing processes, exemplifying his dedication to developing efficient and effective solutions in the field. As he continues to collaborate with industry professionals, the future holds promising advancements that could further revolutionize semiconductor cleaning techniques.

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