Doris Kwok

Title: Doris Kwok: Innovator in Polishing Slurry Technology

Introduction

Doris Kwok is a notable inventor based in Fishers, IN (US). She has made significant contributions to the field of polishing slurry technology, holding a total of 4 patents. Her work has advanced the understanding and application of polishing slurries in various industries.

Latest Patents

Doris Kwok's latest patents focus on the formulation of polishing slurries. One of her notable inventions includes a polishing slurry that contains polishing particles with a mean particle diameter of less than about 5 µm. This innovative slurry comprises at least about 0.5 total weight percent oxidizer, selected from a group that includes HNO, Ni(NO), Al(NO), Mg(NO), Zn(NO), and NH4NO3. Additionally, a small but effective amount of a co-oxidizer, chosen from various compounds such as perbromates, perchlorates, and ferric nitrate, accelerates the removal of substrates. Water forms the balance of this aqueous slurry, enhancing its effectiveness.

Career Highlights

Doris Kwok is currently employed at Praxair S.T. Technology, Inc., where she continues to develop innovative solutions in her field. Her expertise in polishing slurry technology has positioned her as a key player in her organization.

Collaborations

Doris has collaborated with notable coworkers, including Lei Liu and James Kent Knapp, contributing to the advancement of their projects and innovations.

Conclusion

Doris Kwok's contributions to polishing slurry technology exemplify her dedication to innovation and excellence. Her patents and work at Praxair S.T. Technology, Inc. highlight her impact on the industry.