The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2001
Filed:
Jan. 18, 2000
Applicant:
Inventors:
Lei Liu, Carmel, IN (US);
Doris Kwok, Fishers, IN (US);
Assignee:
Praxair S.T. Technology, Inc., North Haven, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 ; B24B 1/00 ;
U.S. Cl.
CPC ...
C09K 3/14 ; B24B 1/00 ;
Abstract
The polishing slurry includes polishing particles having a mean particle diameter of less than about 5 &mgr;m. The slurry contains at least about 0.5 weight percent oxidizer selected from at least one of the group consisting of HNO,, Ni(NO,),, Al(NO,),, Mg(NO,),, Zn(NO,),and NH,NO,. A small but effective amount of a co-oxidizer selected from the group consisting of perbromates, perchlorates, periodates, persulfates, permanganates and ferric nitrate accelerates removal of substrates; and water forms the balance of the aqueous slurry.