Bear, DE, United States of America

Donna Marie Alden

USPTO Granted Patents = 8 

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 12(Granted Patents)


Company Filing History:


Years Active: 2012-2025

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8 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Inventor Donna Marie Alden

Introduction

Donna Marie Alden, a prominent inventor based in Bear, Delaware, boasts an impressive portfolio of seven patents. Her work primarily focuses on advancements in chemical mechanical polishing (CMP) technologies, which are essential in the semiconductor and materials industries. Alden’s innovative contributions have made a significant impact on the performance and efficiency of polishing processes.

Latest Patents

Alden’s latest patents showcase her expertise in developing methods and materials to enhance polishing techniques. One notable invention is titled "Methods of making chemical mechanical polishing layers having improved uniformity." This patent details processes for manufacturing CMP layers that involve creating liquid-filled microelements with a polymeric shell, which are then classified and transformed to produce a polymeric pad matrix for more effective polishing applications.

Another significant invention is the "Alkaline-earth metal oxide-polymeric polishing pad," designed for polishing various substrates, including semiconductor and optical components. This innovative polishing pad features a polymeric matrix integrated with fluid-filled microelements to create a textured surface, significantly improving the polishing process's efficacy.

Career Highlights

Donna Marie Alden works at Rohm and Haas Electronic Materials CMP Holdings, Inc., a company recognized for its development of cutting-edge materials used in electronics manufacturing. Throughout her career, Alden has been at the forefront of innovation, contributing valuable insights and technological advancements.

Collaborations

Alden collaborates with notable colleagues, including Andrew Wank and Joseph K. So, further enhancing her contributions to the field. These collaborations enable her to share knowledge and expertise, fostering a dynamic work environment committed to advancing polishing technologies.

Conclusion

As a leading inventor, Donna Marie Alden’s work enriches the manufacturing landscape through her patented innovations. With her dedication to improving chemical mechanical polishing processes, Alden continues to inspire future inventors while significantly influencing the semiconductor and materials industries.

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