Dong-Woon Shin

Title: Innovations by Dong-Woon Shin: Pioneering Semiconductor Technologies

Introduction: Dong-Woon Shin is a notable inventor based in Seongnam-si, South Korea, recognized for his contributions to semiconductor technology. With a portfolio of three patents, he has been instrumental in advancing methods and materials essential for modern electronics.

Latest Patents: One of Dong-Woon Shin's latest patents encompasses a precursor composition for the deposition of silicon dioxide film and methods of fabricating semiconductor devices utilizing this composition. The invention details a precursor composition that includes at least one precursor compound represented by specific chemical formulas. This is crucial for forming a silicon dioxide film on substrates. In conjunction with this, he has also developed methods to manufacture semiconductor devices featuring fine patterns, which involves a sophisticated process including the formation of etch-target films, mask pattern creation, and etching techniques.

Career Highlights: Dong-Woon Shin has made significant strides in the semiconductor field while working at Samsung Electronics Co., Ltd. His innovative approaches are not only pivotal for semiconductor fabrication but also reflect the cutting-edge technology that drives the industry forward.

Collaborations: In his endeavor to push the boundaries of technology, Dong-Woon collaborates with talented colleagues such as Bong-hyun Kim and Soo-jin Hong. Together, they contribute to a dynamic environment that fosters innovation and excellence within their projects.

Conclusion: Dong-Woon Shin’s work exemplifies the spirit of innovation in the semiconductor industry. His patents are a testament to his ingenuity and dedication to developing novel solutions that impact the electronics sector significantly. As technology continues to evolve, inventors like Shin play a crucial role in shaping the future of electronic devices and systems.