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For the Inventor, By the Inventor

Seoul, South Korea

Dong-Won Jung

This inventor holds 5 USPTO granted patents and 1 EPO patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2000-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong-Won Jung. Retrieved from https://idiyas.com/inventor/dong-won-jung-np1t90ll

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 100.0


Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 16(Granted Patents)


Company Filing History:

goldMedal5 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2000-2001

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5 patents (USPTO):Explore Patents
1. 6300036 - Photosensitive polymers and chemically amplified photoresist compositions using the same (2001-10-09),
2. 6287747 - Photosensitive polymer having cyclic backbone and resist composition comprising the same (2001-09-11),
3. 6280903 - Chemically amplified resist composition (2001-08-28),
4. 6277538 - Photosensitive polymer having cyclic backbone and resist composition comprising the same (2001-08-21),
5. 6114084 - Chemically amplified resist composition (2000-09-05),

Title: Innovations of Dong-Won Jung in Photosensitive Polymers

Introduction

Dong-Won Jung is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of photosensitive polymers, particularly in the development of chemically amplified photoresist compositions. With a total of 5 patents to his name, Jung's work has had a substantial impact on the semiconductor industry.

Latest Patents

One of his latest patents focuses on photosensitive polymers and chemically amplified photoresist compositions. These compounds belong to a class of photosensitive polymers designed for use in chemically amplified photoresists. The photoresists produced using these polymers yield sharp line patterns when exposed to an ArF excimer laser. The polymer composition includes a copolymer, while the photoresist composition features a terpolymer with a photo acid generator. The resulting chemically amplified photoresist compositions exhibit strong resistance to dry etching, excellent adhesion to film materials, and compatibility with conventional developers. Another notable patent involves a photosensitive polymer characterized by a cyclic backbone, along with a resist composition that incorporates this polymer.

Career Highlights

Dong-Won Jung is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of materials science. His work has been instrumental in advancing technologies that are critical to the production of semiconductors and other electronic components.

Collaborations

Jung has collaborated with several talented individuals in his field, including Sang-Jun Choi and Yool Kang. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in photosensitive materials.

Conclusion

Dong-Won Jung's contributions to the field of photosensitive polymers and photoresist compositions are noteworthy. His innovative work at Samsung Electronics Co., Ltd. continues to shape the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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