The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 2000
Filed:
Oct. 02, 1998
Yool Kang, Kyunggi-do, KR;
Sang-Jun Choi, Kyunggi-do, KR;
Dong-Won Jung, Seoul, KR;
Chun-Geun Park, Kyunggi-do, KR;
Young-Bum Koh, Seoul, KR;
Samsung Electronics Co. Ltd., Kyunggi Do, KR;
Abstract
Copolymers and terpolymers are used in chemically amplified resists. The terpolymers are of the formula: ##STR1## wherein R.sub.3 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R.sub.4 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof, R.sub.5 is selected from the group consisting of hydrogen and methyl; R.sub.6 is selected from the group consisting of t-butyl and tetrahydropyranyl; M and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5. Also, a resist composition for use in a chemically amplified resist, which comprises a photoacid generator and a polymer having the formula: ##STR2## wherein x is selected from the group consisting of C.sub.5 to C.sub.8 cyclic or alicyclic composition, R.sub.7 is selected from the group consisting of hydrogen and methyl; R.sub.4 is selected from the group consisting of t-butyl, tetrahydropyranyl and adamantyl; m and n are each integers; and the ratio n/(m+n) ranges from about 0.1 to about 0.5.