The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 11, 2001

Filed:

Dec. 17, 1999
Applicant:
Inventors:

Sang-jun Choi, Seoul, KR;

Dong-won Jung, Seoul, KR;

Si-hyeung Lee, Suwon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 ; C08F 2/400 ; C08F / ; C08F / ;
U.S. Cl.
CPC ...
G03F 7/039 ; C08F 2/400 ; C08F / ; C08F / ;
Abstract

A photosensitive polymer represented by the following formula, and a resist composition including (a) a photosensitive polymer represented by the following formula:


Find Patent Forward Citations

Choi, Sang-jun. (2001). Photosensitive polymer having cyclic backbone and resist composition comprising the same (U.S. Patent No. 6287747). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6287747

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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