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For the Inventor, By the Inventor

Tokyo, Japan

Dong-Kyun Choi

This inventor holds 5 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2001-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dong-Kyun Choi. Retrieved from https://idiyas.com/inventor/dong-kyun-choi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 5

% Patents Active = 80.0

Average Co-Inventor Count = 5.3

ph-index = 2

Forward Citations = 20(Granted Patents)


Location History:

  • Tokyo-To, JP (2006)
  • Tokyo, JP (2008)
  • Nirasaki, JP (2001 - 2009)

Company Filing History:

goldMedal5 out of 10,904 
 
Tokyo Electron Limited
 patents

Years Active: 2001-2009

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5 patents (USPTO):Explore Patents
1. 7546840 - Method for cleaning reaction container and film deposition system (2009-06-16),
2. 7368384 - Film formation apparatus and method of using the same (2008-05-06),
3. 7084023 - Method of manufacturing semiconductor device, film-forming apparatus, and storage medium (2006-08-01),
4. 7041546 - Film forming method for depositing a plurality of high-k dielectric films (2006-05-09),
5. 6313047 - MOCVD method of tantalum oxide film (2001-11-06),

Title: Innovations by Dong-Kyun Choi

Introduction

Dong-Kyun Choi is a prominent inventor based in Tokyo-to, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on improving processes related to film deposition and cleaning in semiconductor manufacturing.

Latest Patents

One of his latest patents is a method for cleaning reaction containers used in semiconductor processes. This innovative method allows for the efficient cleaning of the interior of a reaction vessel after the formation of ruthenium (Ru) or ruthenium oxide films. By heating the reaction vessel to temperatures above 850°C and reducing the pressure, oxygen gas is introduced to clean off the films without contaminating the wafers. Additionally, he has developed a film formation apparatus that includes a method for removing by-product films from the inner surfaces of reaction chambers. This process involves supplying a cleaning gas containing hydrogen fluoride while maintaining a specific atmosphere within the chamber.

Career Highlights

Dong-Kyun Choi is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work has been instrumental in advancing technologies that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

He has collaborated with notable coworkers, including Kazuhide Hasebe and Yuichiro Morozumi, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Dong-Kyun Choi's innovative patents and contributions to the semiconductor industry highlight his expertise and commitment to advancing technology. His work continues to influence the field and improve manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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