Dong Jun Kim

Title: The Innovations of Dong Jun Kim

Introduction

Dong Jun Kim is a prominent inventor based in San Jose, CA, known for his contributions to the field of integrated circuits. With a total of 6 patents to his name, he has made significant advancements in semiconductor technology.

Latest Patents

One of his latest patents focuses on substrate isolation in integrated circuits. This innovation involves the formation of substrate isolation trenches in a semiconductor substrate. Dopants, such as boron, are implanted into the trench sidewalls through ion implantation to suppress current leakage. During this process, the transistor gate dielectric faces the ion stream, but any damage incurred is subsequently annealed in thermal steps. In certain embodiments, the dopant implantation is performed at an angle, with implants executed from opposite sides of the wafer. Each active area includes regions implanted from both sides, allowing for overlapping regions that facilitate threshold voltage adjustment.

Career Highlights

Throughout his career, Dong Jun Kim has worked with notable companies, including Promos Technologies, Inc. and Mosel Vitelic Corporation. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Dong Jun Kim has collaborated with several professionals in his field, including Hua Ji and Jin-Ho Kim. These collaborations have likely enhanced his research and development efforts.

Conclusion

Dong Jun Kim's work in integrated circuits and semiconductor technology showcases his innovative spirit and dedication to advancing the field. His patents reflect a commitment to improving electronic devices and their performance.