Dong-Duk Lee

Title: Innovations of Dong-Duk Lee in Semiconductor Fabrication

Introduction

Dong-Duk Lee is a prominent inventor based in Kyoungki-do, South Korea. He has made significant contributions to the field of semiconductor device fabrication. With a total of 2 patents, his work has advanced the technology used in modern electronics.

Latest Patents

Dong-Duk Lee's latest patents include a method for fabricating a semiconductor device. This method involves forming a first inter-layer insulation layer on a substrate with multiple cell contact plugs. It also includes selectively etching the insulation layer to create first contact holes, cleaning the etch residues, and forming insulating fences on the inner walls of these holes. Additionally, he has developed a method for fabricating a semiconductor device using tungsten as a sacrificial hard mask. This innovative approach includes forming a layer on an etch target layer and using a photoresist pattern as an etch mask.

Career Highlights

Dong-Duk Lee is currently employed at Hynix Semiconductor Inc., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor devices.

Collaborations

Some of his notable coworkers include Sung-Kwon Lee and Kwang-Ok Kim, who have collaborated with him on various projects within the semiconductor industry.

Conclusion

Dong-Duk Lee's contributions to semiconductor fabrication are noteworthy and reflect his expertise in the field. His innovative methods are paving the way for advancements in technology that will benefit the electronics industry for years to come.