Dmitri Daineka

Title: Dmitri Daineka: Innovator in Plasma Deposition Technology

Introduction

Dmitri Daineka is a notable inventor based in Palaiseau, France, recognized for his contributions to the field of plasma deposition technology. With a total of six patents to his name, Daineka has made significant advancements in methods and apparatuses for forming films through plasma deposition.

Latest Patents

Daineka's latest patents include a "Method and apparatus for forming a film by deposition from a plasma." This invention describes an apparatus designed for depositing a film on a substrate using plasma. The apparatus features an enclosure, multiple plasma generator elements, and a substrate support mechanism. Each plasma generator element consists of a microwave antenna that emits microwaves, a magnet that creates an electron cyclotron resonance region for plasma generation, and a gas entry element that directs gas towards the film deposition area. Another significant patent is the "Device for forming a film by deposition from a plasma," which outlines a plasma excitation device for film deposition using distributed electron cyclotron resonance.

Career Highlights

Dmitri Daineka has worked with prestigious organizations such as École Polytechnique and Dow Corning Corporation. His experience in these institutions has contributed to his expertise in plasma technology and film deposition processes.

Collaborations

Daineka has collaborated with notable colleagues, including Pere Roca I Cabarrocas and Pavel Bulkin, further enhancing his work in the field of plasma deposition.

Conclusion

Dmitri Daineka's innovative work in plasma deposition technology has led to significant advancements in the field, as evidenced by his six patents. His contributions continue to influence the development of new methods and devices for film formation.