This inventor holds 4 USPTO granted patents. Top assignee: Industrial Technology Research Institute. Active years: 2020-2026.
Company Filing History:
Years Active: 2020-2026
Title: The Innovations of Ding-Shiang Wang
Introduction
Ding-Shiang Wang is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of technology, particularly in the development of methods for enhancing substrate processing. With a total of 4 patents to his name, Wang's work reflects a commitment to innovation and advancement in his field.
Latest Patents
Wang's latest patents include a method of performing selective etch on an array substrate. This method involves mixing deionized water, hydrogen peroxide, and an acid to create a first solution. The array substrate, which consists of a substrate and a component layer, is treated with this solution to effectively remove the component layer. Additionally, he has developed a manufacturing method for an ESD protection device. This method includes surface treatment of the substrate, formation of a link layer with metal material, and the creation of a progressive layer that gradually increases in oxygen concentration.
Career Highlights
Ding-Shiang Wang is affiliated with the Industrial Technology Research Institute, where he has been instrumental in various research projects. His innovative approaches have led to advancements in substrate processing techniques, which are crucial for the development of electronic devices.
Collaborations
Wang has collaborated with several esteemed colleagues, including Ming-Sheng Leu and Jia-Jen Chang. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and enhances the quality of research.
Conclusion
Ding-Shiang Wang's contributions to technology through his patents and collaborative efforts highlight his role as a leading inventor in his field. His work continues to influence advancements in substrate processing and electronic device manufacturing.