This inventor holds 3 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1998-2001.
Company Filing History:
Years Active: 1998-2001
Title: The Innovations of Ding-Shan Wang
Introduction
Ding-Shan Wang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer processing. With a total of 3 patents to his name, Wang's work has had a considerable impact on the industry.
Latest Patents
Wang's latest patents focus on the use of wafer edge exposure (WEE) to prevent polyimide contamination during semiconductor processing. One of his methods involves sealing the edge of a wafer against slurry debris and contaminants encountered during grinding and backlapping. This process includes depositing a photosensitive polyimide as a dielectric material on the wafer and mounting it on a chuck. A light source is introduced above the wafer, exposing an outer ring of the circumferential edge to light. The exposed ring is fixed in place, allowing only the unexposed polyimide to be dissolved during development, forming "scribe channels." This innovative approach effectively seals the perimeter of the wafer, preventing polishing contaminants from entering the scribe channels.
Career Highlights
Ding-Shan Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing wafer processing techniques, contributing to the efficiency and reliability of semiconductor manufacturing.
Collaborations
Wang has collaborated with several talented individuals in his field, including Liang Szuma and Hsiang Sheng Liu. These partnerships have fostered innovation and have been crucial in the development of his patented technologies.
Conclusion
Ding-Shan Wang's contributions to semiconductor technology through his innovative patents demonstrate his expertise and commitment to advancing the industry. His work continues to influence the field, ensuring the ongoing development of efficient semiconductor processing methods.