Unterhaching, Germany

Dietrich Widmann


Average Co-Inventor Count = 1.9

ph-index = 12

Forward Citations = 394(Granted Patents)


Location History:

  • Unterhaching, DE (1976 - 2002)
  • Glen Allen, VA (US) (2003)
  • late of Unterhaching, DE (2002 - 2004)

Company Filing History:


Years Active: 1976-2004

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28 patents (USPTO):

Title: **The Innovative Contributions of Dietrich Widmann**

Introduction

Dietrich Widmann, a notable inventor based in Unterhaching, Germany, has made significant contributions to the field of integrated circuit fabrication. With an impressive portfolio of 28 patents, Widmann has been at the forefront of technological advancements in lithography methods essential for modern electronics. His expertise and innovative spirit are reflected in his recent inventions that address critical challenges in semiconductor manufacturing.

Latest Patents

Among Dietrich Widmann's latest patents is a **Lithography Method and Lithography Mask**, which focuses on patterning layers during the fabrication of integrated circuits. This invention utilizes a mask—either reflective or transmissive—to guide radiation from a source onto photosensitive layers, specifically employing radiation in the extreme ultraviolet region. Another noteworthy patent is related to **Contact Hole Fabrication with the Aid of Mutually Crossing Sudden Phase Shift Edges of a Single Phase Shift Mask**. This technique allows for the lithographic production of small structures at resolutions defined by exposure radiation wavelengths. The design incorporates first and second phase-shift regions to create intricate patterns that enable the exposure of extremely small contact holes during semiconductor production, effectively reducing fabrication costs.

Career Highlights

Dietrich Widmann has been associated with prominent companies in the semiconductor industry, including Siemens Aktiengesellschaft and Infineon Technologies AG. His tenure in these organizations has equipped him with a robust understanding of the complexities involved in semiconductor technologies, deepening his contributions to the field.

Collaborations

Throughout his successful career, Widmann has collaborated with esteemed colleagues such as Gerhard Enders and Lothar Risch. These partnerships have fostered an environment of innovation and have played a critical role in driving advancements in lithography techniques.

Conclusion

Dietrich Widmann's dedication to innovation is evident in his extensive patent portfolio and collaborative efforts. His inventions in lithography methods not only contribute to the efficient production of integrated circuits but also pave the way for future developments in semiconductor technology. Widmann's work remains a valuable asset to the field, reflecting the importance of creativity and collaboration in driving technological progress.

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