Company Filing History:
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1 out of 1 Years Active: 2018-2023
Title: Deyan Chen: Innovator in Semiconductor Technology
Introduction
Deyan Chen is a prominent inventor based in Shanghai, China, known for his significant contributions to semiconductor technology. With a total of four patents to his name, Chen has made strides in developing advanced semiconductor structures and devices.
Latest Patents
One of Chen's latest patents is titled "Semiconductor structure and method for forming the same." This patent outlines a method for creating a semiconductor structure that involves providing a substrate with distinct regions, forming fin structures, and establishing isolation structures between them. The process includes the formation of a mask layer and a gate structure that covers the first region of the substrate.
Another notable patent is for an "LDMOS device and manufacturing method thereof." This invention describes an LDMOS device that features a substrate with a drift region, a gate structure, and a drain region. The design aims to improve device breakdown voltage without increasing Rdson, showcasing Chen's innovative approach to semiconductor device manufacturing.
Career Highlights
Deyan Chen has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technology in the field.
Collaborations
Throughout his career, Chen has collaborated with notable professionals such as Dae-Sub Jung and Xuejie Shi. These partnerships have further enhanced his work and innovation in semiconductor technology.
Conclusion
Deyan Chen's contributions to semiconductor technology through his patents and career achievements highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor devices and structures.