Bengaluru, India

Devendra Channappa Holeyannavar

This inventor holds 13 USPTO granted patents and 4 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2019-2025.

USPTO Granted Patents = 13 

% Patents Active = 100.0

Average Co-Inventor Count = 6.3

ph-index = 2

Forward Citations = 18(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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13 patents (USPTO):Explore Patents

Title: Biography of Devendra Channappa Holeyannavar

Introduction: Devendra Channappa Holeyannavar is an accomplished inventor based in Bengaluru, India. He has made significant contributions to the field of electronic device manufacturing, holding a total of 12 patents. His innovative work focuses on enhancing factory interfaces and load port technologies.

Latest Patents: Among his latest patents is the "Shortened load port for factory interface." This invention describes devices, systems, and methods for integrating load locks into a factory interface footprint space. The load port is designed to receive a substrate carrier and includes a frame adapted for connection to a factory interface. Another notable patent is "Factory interface robots usable with integrated load locks," which involves a factory interface robot configured to transfer substrates between substrate carriers and load locks.

Career Highlights: Devendra currently works at Applied Materials, Inc., a leading company in the field of materials engineering solutions. His role involves developing advanced technologies that improve manufacturing processes for electronic devices.

Collaborations: Throughout his career, Devendra has collaborated with notable professionals, including Dean C Hruzek and Michael Robert Rice. These collaborations have contributed to the advancement of his innovative projects and patents.

Conclusion: Devendra Channappa Holeyannavar is a prominent figure in the realm of electronic device manufacturing. His patents and collaborative efforts continue to drive innovation in the industry, showcasing

Profile summary based on public USPTO records.
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