Ichon-shi, South Korea

Deok Sin Kil


Average Co-Inventor Count = 1.9

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Kyoungki-do, KR (2006 - 2007)
  • Ichon-shi, KR (2003 - 2012)

Company Filing History:


Years Active: 2003-2012

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4 patents (USPTO):Explore Patents

Title: Innovations by Deok Sin Kil in Semiconductor Technology

Introduction

Deok Sin Kil, an accomplished inventor based in Ichon-shi, South Korea, is recognized for his significant contributions to semiconductor technology. With a total of four patents to his name, Kil has developed innovative methods that enhance the performance and efficiency of various semiconductor devices.

Latest Patents

Two of his latest patents include a groundbreaking "Method for forming dielectric film" and a "Method for forming capacitor in semiconductor device using the same." The first patent presents a method for forming a dielectric film that significantly improves dielectric characteristics and reduces leakage current. This method involves forming a zirconium dioxide (ZrO) layer over a wafer with controlled thickness and an aluminum oxide (AlO) layer over areas where the ZrO layer is absent.

The second patent focuses on a method for creating a capacitor in semiconductor devices, which effectively enhances leakage current characteristics by utilizing HfxAlyOz as a dielectric film. This innovative approach consists of depositing HfxAlyOz thin films on a storage electrode, where the composition of Hafnium (Hf) and Aluminum (Al) is strategically varied in the laminated layers for optimal performance.

Career Highlights

Deok Sin Kil is currently employed at Hynix Semiconductor Inc., a leading player in the semiconductor industry. His inventive work is critical to advancing technologies within the company, allowing for enhanced semiconductor device functionalities.

Collaborations

Throughout his career, Kil has collaborated with talented colleagues including Kwon Hong and Seung Jin Yeom. These partnerships have fostered a collaborative environment, leading to significant breakthroughs and innovations in semiconductor technologies.

Conclusion

Deok Sin Kil's innovative methods in forming dielectric films and capacitors highlight his expertise and dedication to advancing semiconductor technology. His contributions continue to impact the industry and reflect the importance of collaboration and invention in developing cutting-edge solutions. As the semiconductor sector evolves, Kil remains a key player, pushing the boundaries of innovation in this critical field.

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