Demetrius Sarigiannis

Title: Demetrius Sarigiannis: Pioneering Inventor at Micron Technology Incorporated

Introduction:

Demetrius Sarigiannis, a talented inventor based in Boise, ID, has made significant contributions to the field of atomic layer deposition (ALD) with a remarkable portfolio of 25 patents. His innovative solutions have revolutionized processes in the semiconductor industry, particularly in enhancing throughput and efficiency.

Latest Patents:

Sarigiannis' latest patents include groundbreaking inventions such as the "Insitu Post Atomic Layer Deposition Destruction of Active Species" and "Methods of Titanium Deposition." The former focuses on improving ALD processes by efficiently purging active species from the reactor, thereby increasing throughput. The latter patent highlights methods for titanium deposition that enable the formation of titanium silicide while maintaining an electrically insulative surface.

Career Highlights:

As a key figure at Micron Technology Incorporated, Sarigiannis has played a pivotal role in driving technological advancements within the company. His expertise in ALD processes has led to the development of cutting-edge solutions that have propelled Micron Technology to the forefront of semiconductor innovation.

Collaborations:

Sarigiannis has collaborated closely with esteemed colleagues at Micron Technology, including Garo Jacques Derderian and Cem Basceri. Together, they have undertaken projects that have resulted in the successful implementation of novel technologies and processes within the company.

Conclusion:

Demetrius Sarigiannis stands as a beacon of innovation in the semiconductor industry, with a remarkable track record of patents that have revolutionized ALD processes. His inventive spirit and collaborative efforts at Micron Technology have undoubtedly paved the way for future advancements in semiconductor technology.