The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2009
Filed:
Mar. 08, 2005
Demetrius Sarigiannis, Boise, ID (US);
Garo J. Derderian, Boise, ID (US);
Cem Basceri, Boise, ID (US);
Gurtej S. Sandhu, Boise, ID (US);
F. Daniel Gealy, Kuna, ID (US);
Chris M. Carlson, Boise, ID (US);
Demetrius Sarigiannis, Boise, ID (US);
Garo J. Derderian, Boise, ID (US);
Cem Basceri, Boise, ID (US);
Gurtej S. Sandhu, Boise, ID (US);
F. Daniel Gealy, Kuna, ID (US);
Chris M. Carlson, Boise, ID (US);
Micron Technology, Inc., Boise, ID (US);
Abstract
A deposition method includes positioning a substrate within a deposition chamber defined at least in part by chamber walls. At least one of the chamber walls comprises a chamber surface having a plurality of purge gas inlets to the chamber therein. A process gas is provided over the substrate effective to deposit a layer onto the substrate. During such providing, a material adheres to the chamber surface. Reactive purge gas is emitted to the deposition chamber from the purge gas inlets effective to form a reactive gas curtain over the chamber surface and away from the substrate, with such reactive gas reacting with such adhering material. Further implementations are contemplated.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile