Demetre J Economou

Title: Demetre J Economou: Innovator in Atomic Layer Etching

Introduction

Demetre J Economou is a prominent inventor based in Houston, TX (US). He has made significant contributions to the field of atomic layer etching, holding a total of 9 patents. His work focuses on advancing technologies that enhance the precision and efficiency of etching processes.

Latest Patents

One of Economou's latest patents is titled "Atomic layer etching with pulsed plasmas." This invention describes a system and method for rapid atomic layer etching (ALET) that includes a pulsed plasma source, a spiral coil electrode, a cooled Faraday shield, and a reaction chamber with a substrate support. The method involves positioning an etchable substrate in a plasma etching chamber, forming a product layer on the substrate's surface, and then removing portions of this layer by pulsing the plasma source. This process is repeated to achieve the desired etched substrate.

Another notable patent is for "Systems and methods for rapidly fabricating nanopatterns in a parallel fashion over large areas." This method, known as nanopantography, allows for the patterning of nanofeatures over extensive areas. It utilizes highly selective plasma etching with an oxide layer of silicon as a hard mask, improving patterning speed and etch profile. This technique enables the fabrication of high aspect ratio features without mask undercut, showcasing Economou's innovative approach to complex patterning.

Career Highlights

Demetre J Economou has had a distinguished career, working with esteemed organizations such as the University of Houston System and Tokyo Electron Limited. His expertise in plasma etching and nanopatterning has positioned him as a leader in his field.

Collaborations

Throughout his career, Economou has collaborated with notable professionals, including Vincent M Donnelly and Lee Chen. These partnerships have contributed to the advancement of technologies in atomic layer etching and nanopatterning.

Conclusion

Demetre J Economou's contributions to the field of atomic layer etching and nanopatterning have established him as a key figure in innovation. His patents reflect a commitment to enhancing etching processes and advancing technology in this critical area.