Location History:
- Doddennakundi Village, IN (2022)
- Bengaluru, IN (2024)
Company Filing History:
Years Active: 2022-2024
Title: Deepak Rameshkumar Tanna: Innovator in Integrated Circuit Technology
Introduction
Deepak Rameshkumar Tanna is a notable inventor based in Bengaluru, India. He has made significant contributions to the field of integrated circuit technology, holding two patents that showcase his innovative approach to solving complex engineering challenges.
Latest Patents
One of his latest patents is titled "Saving and restoring configuration and status information with reduced latency." This invention involves an apparatus that includes a port circuit to receive configuration writes from a source circuit, a save restore memory to store information of control and status registers, and a configuration network connected to multiple nodes. This design aims to enhance the efficiency of configuration management in integrated circuits.
Another patent, "Die stack override for die testing," discloses structures and techniques for exposing circuitry during die testing. This invention features an integrated circuit die with conductive contacts and die stack emulation circuitry, allowing for flexible testing configurations through a switch that connects different circuitry based on its state.
Career Highlights
Deepak Rameshkumar Tanna is currently employed at Intel Corporation, a leading technology company known for its advancements in semiconductor manufacturing and integrated circuit design. His work at Intel has positioned him as a key player in the development of innovative technologies that drive the industry forward.
Collaborations
Some of his notable coworkers include Terrence Huat Hin Tan and Rehan M Sheikh, who contribute to the collaborative environment at Intel Corporation. Their combined expertise fosters a culture of innovation and excellence in engineering.
Conclusion
Deepak Rameshkumar Tanna's contributions to integrated circuit technology through his patents reflect his commitment to innovation and engineering excellence. His work continues to influence the field and inspire future advancements in technology.