Company Filing History:
Years Active: 2021-2025
Title: Debashish Basu: Innovator in Integrated Circuit Technology
Introduction
Debashish Basu is a prominent inventor based in Beaverton, OR (US). He has made significant contributions to the field of integrated circuit technology, holding a total of 4 patents. His work focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Basu's latest patents include innovative methods for improving the fabrication of integrated circuits. One of his notable patents is titled "Simultaneous filling of variable aspect ratio single damascene contact to gate and trench vias with low resistance barrierless selective metallization." This patent describes an integrated circuit structure that features a first metal layer with conductive features and a second metal layer with additional conductive features. The design incorporates a via layer within an insulating layer, allowing for the formation of first and second vias with different aspect ratios. A barrier-less metal partially fills the first vias while a pure metal fills the remainder, optimizing the circuit's performance.
Another significant patent is the "Via contact patterning method to increase edge placement error margin." This method involves creating a pattern of alternating trench contacts and gates over a support structure. The trench contacts are insulated from adjacent gates by dielectric materials, and the gates are recessed relative to the trench contacts. This innovative approach enhances the edge placement error margin, which is crucial for the formation of via contacts in metallization stacks.
Career Highlights
Debashish Basu is currently employed at Intel Corporation, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced manufacturing techniques that improve the performance and reliability of integrated circuits.
Collaborations
Throughout his career, Basu has collaborated with notable colleagues, including Charles Henry Wallace and Reken Patel. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Debashish Basu is a key figure in the field of integrated circuit technology, with a focus on improving manufacturing processes through his innovative patents. His contributions at Intel Corporation and collaborations with esteemed colleagues highlight his commitment to advancing semiconductor technology.