David William Callan

This inventor holds 2 USPTO granted patents. Top assignees: Asml Netherlands B.v., Asml Holding N.v.. Active years: 2005-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David William Callan. Retrieved from https://idiyas.com/inventor/david-william-callan

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 2

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 9(Granted Patents)

Location History:

Norwalk, US (2005)
Norwalk, CT (US) (2010)

Company Filing History:

2 out of 5,076

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2005-2010

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2 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7714305 - Lithographic apparatus and device manufacturing method (2010-05-11),

2. 6879377 - Lithographic apparatus and device manufacturing method (2005-04-12),

Title: The Innovative Mind of David William Callan

Introduction: David William Callan, a brilliant inventor hailing from Norwalk, CT (US), is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: David William Callan holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems.

Career Highlights: Throughout his illustrious career, David William Callan has consistently pushed the boundaries of innovation, with his inventions revolutionizing industries such as telecommunications, robotics, and renewable energy.

Collaborations: David William Callan has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life, demonstrating his ability to work effectively in multidisciplinary teams.

Conclusion: In conclusion, David William Callan stands as a testament to the power of human ingenuity and the impact that one individual can have on the world through innovation and invention.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]