David Paul Agnello

Title: Innovator David Paul Agnello – Pioneering Cobalt Disilicide Structures

Introduction

David Paul Agnello is an inventive mind based in Wappingers Falls, NY. With a noteworthy portfolio that includes three patents, he has made significant contributions to the field of semiconductor technology. His focused research and development efforts at International Business Machines Corporation (IBM) demonstrate his commitment to innovation.

Latest Patents

David's latest patents revolve around advanced cobalt disilicide structures. One of his notable inventions involves a structure that encompasses a layer of cobalt disilicide, designed to be substantially free of cobalt monosilicide. This structure is also characterized by the absence of stringers of titanium oxide. The application specifically addresses components of an insulated-gate field effect transistor (FET), optimizing performance by ensuring that the is layers exhibit minimal impurities during fabrication.

Another patent focused on the removal of titanium oxide, a byproduct from the formation of cobalt disilicide within an FET, further highlights his ingenuity. This patent introduces a technique that involves a reagent that does not chemically react with cobalt disilicide while effectively removing titanium oxide patches, utilizing a combination of water, ammonium hydroxide, and hydrogen peroxide.

Career Highlights

David has established a remarkable career at IBM, where his inventive contributions have propelled advancements in semiconductor technology. His commitment to perfection and detail resonates through his work, which addresses critical challenges in the industry.

Collaborations

Throughout his career, David has worked alongside talented professionals like Mary Conroy Bushey and Donna Kaye Johnson. Together, they have leveraged their expertise to drive innovative solutions within their projects, promoting a collaborative environment enriched with knowledge and experience.

Conclusion

David Paul Agnello's contributions to the field of inventions, particularly in cobalt disilicide structures, underscore his role as an influential figure in semiconductor research. His dedication to innovation at IBM reflects a broader commitment to advancing technology, demonstrating the critical impact of inventors in shaping the future of industry.