David P Favreau

Title: The Innovations of David P. Favreau

Introduction

David P. Favreau is an accomplished inventor based in Coopersburg, PA (US). He holds a total of 4 patents that showcase his contributions to the field of integrated circuits. His work has significantly impacted the technology landscape, particularly in programmable antifuses and integrated circuit processes.

Latest Patents

Among his latest patents is the "Self-aligned vertical antifuse," which features an integrated circuit with a plurality of programmable antifuses. Each antifuse can be programmed to connect metal runners on one level with either or both of a pair of runners on a second level. Another notable patent is the "Integrated circuit process using a 'hard mask'," which utilizes a layer of spin-on-glass as a hard mask for patterning an underlying layer of polysilicon. This patterned polysilicon is essential for the gate structures of field-effect transistors.

Career Highlights

David has had a distinguished career, working at renowned companies such as AT&T Bell Laboratories and AT&T Corp. His experience in these organizations has allowed him to develop innovative solutions and contribute to significant advancements in technology.

Collaborations

Throughout his career, David has collaborated with talented individuals, including Daniel J. Vitkavage and Cheryl Anne Bollinger. These partnerships have fostered a creative environment that has led to groundbreaking inventions.

Conclusion

David P. Favreau's contributions to the field of integrated circuits through his patents and collaborations highlight his role as a significant inventor. His work continues to influence the technology industry, showcasing the importance of innovation in driving progress.