This inventor holds 5 USPTO granted patents. Top assignees: Mdc Max Daetwyler Ag, Ohio Electronic Engravers, Inc.. Active years: 1997-2003.
Location History:
- Englewood, OH (US) (1997 - 2002)
- Dayton, OH (US) (1998 - 2003)
Company Filing History:
Years Active: 1997-2003
Title: David L. Flannery: Innovator in Engraving Technology
Introduction
David L. Flannery is a notable inventor based in Englewood, OH (US). He has made significant contributions to the field of engraving technology, holding a total of 5 patents. His work focuses on enhancing the precision and efficiency of engraving processes, particularly in gravure engraving.
Latest Patents
Flannery's latest patents include innovative technologies such as an engraver and method for focusing and measuring areas on a workpiece engraved by the engraver. This invention features an error detection apparatus that determines an error value E, which corresponds to the difference between predetermined setup parameters and actual measurements of engraved areas. This error value is crucial for adjusting the engraver to ensure that the actual cuts or etches align with the set parameters. Additionally, the system incorporates an autofocus routine and advanced image processing techniques, including gap filling and light calibration methods, to enhance engraving accuracy.
Another significant patent by Flannery is an error detection apparatus and method specifically designed for use with gravure engravers. This system also determines an error value E and adjusts the engraver accordingly, providing a closed-loop system for engraving cylinders. The method involves generating cell width command signals and measuring the actual widths of engraved cells, allowing for precise adjustments to be made during the engraving process.
Career Highlights
Throughout his career, David L. Flannery has worked with several companies, including Mdc Max Daetwyler AG and Ohio Electronic Engravers, Inc. His experience in these organizations has contributed to his expertise in engraving technology and innovation.
Collaborations
Flannery has collaborated with notable colleagues such as David R. Seitz and Eric J. Serenius. These partnerships have likely fostered a creative environment that has led to advancements in their respective fields.
Conclusion
David L. Flannery's contributions to engraving technology through his patents and collaborations highlight his role as an innovator in the industry. His work continues to influence the precision and efficiency of engraving processes, making a lasting impact on the field.