The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 1998

Filed:

Apr. 03, 1995
Applicant:
Inventors:

Michael Duane Christopher, Dayton, OH (US);

David Flannery, Dayton, OH (US);

David R Setiz, Vandalia, OH (US);

Eric J Serenius, Springboro, OH (US);

Wei Zhao, Cincinnati, OH (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41C / ;
U.S. Cl.
CPC ...
358299 ;
Abstract

An error detection apparatus and method for use with engravers, such as gravure engravers. An error value E corresponding to the difference between a set of predetermined setup parameters and actual measurement of a portion of an engraved area on the cylinder is determined. The error value E is then used to adjust the engraver to engrave an actual cut or etch in accordance with the set of predetermined setup parameters. Advantageously, an error detection and correction system is suitable for providing a closed-loop system for engraving a cylinder. The apparatus and method may be used during initial setup or during normal operation of the engraver. Other features include an autofocus routine to facilitate the auto-focus procedure. Also, image processing is further enhanced by gap filling, discontinuity removal, and light calibration methods which may be used alone, in combination with each other, or in combination with the automatic focus system and/or automatic shoe system.


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