David J Lischka

This inventor holds 17 USPTO granted patents and 6 published patent applications, primarily in Chemical Mechanical Polishing. Top assignee: Applied Materials, Inc.. Active years: 2005-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David J Lischka. Retrieved from https://idiyas.com/inventor/david-j-lischka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 17 (Patent Applications = 6)

% Patents Active = 76.5

Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 100(Granted Patents)

Location History:

San Jose, CA (US) (2005 - 2017)
Austin, TX (US) (2013 - 2024)

Company Filing History:

17 out of 14,482

Applied Materials, Inc.

patents

Years Active: 2005-2026

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Areas of Expertise:

Chemical Mechanical Polishing

Platen Manufacturing

Polishing System

Endpointing

Spectrographic Metrology

Substrate Sensing

Polishing Pad Deformation

Sealed Polishing Pad

Load Cup

Conditioning Mechanism

17 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12605766 - Methods for upper platen manufacturing (2026-04-21),

2. 11919120 - Polishing system with contactless platen edge control (2024-03-05),

3. 9799578 - Peak-based endpointing for chemical mechanical polishing (2017-10-24),

4. 9564377 - Peak-based endpointing for chemical mechanical polishing (2017-02-07),

5. 9056383 - Path for probe of spectrographic metrology system (2015-06-16),

6. 9013176 - Methods and apparatus for sensing a substrate in a load cup (2015-04-21),

7. 8734202 - Load cup substrate sensing (2014-05-27),

8. 8591698 - Peak-based endpointing for chemical mechanical polishing (2013-11-26),

9. 8454408 - Load cup substrate sensing (2013-06-04),

10. 8287330 - Reducing polishing pad deformation (2012-10-16),

11. 7998358 - Peak-based endpointing for chemical mechanical polishing (2011-08-16),

12. 7621798 - Reducing polishing pad deformation (2009-11-24),

13. 7210980 - Sealed polishing pad, system and methods (2007-05-01),

14. 7163437 - System with sealed polishing pad (2007-01-16),

15. 7112119 - Sealed polishing pad methods (2006-09-26),

Title: David J Lischka: Innovator in Polishing Technology

Introduction

David J Lischka is a prominent inventor based in San Jose, CA. He has made significant contributions to the field of polishing technology, holding a total of 17 patents. His work focuses on enhancing the efficiency and effectiveness of polishing systems used in various applications.

Latest Patents

Among his latest innovations is a polishing system with contactless platen edge control. This system features a platen that supports a main polishing pad and is rotatable about its center. An annular flange projects outward to support an outer polishing pad, allowing for vertical deflection and precise control during the polishing process. Another notable patent is for a peak-based endpointing method for chemical mechanical polishing. This method involves storing predetermined criteria to detect the endpoint of polishing by measuring light spectra reflected from the substrate, ensuring optimal results.

Career Highlights

David works at Applied Materials, Inc., a leading company in the semiconductor and display industries. His expertise in polishing technology has positioned him as a key player in the development of advanced manufacturing processes.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Dominic J Benvegnu and Boguslaw A Swedek. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

David J Lischka's contributions to polishing technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the field positively.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

6 patents pending: