Company Filing History:
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Years Active: 2002-2006
Title: The Innovations of David Goodstein
Introduction
David Goodstein, an accomplished inventor based in San Francisco, CA, has made significant contributions to the field of electron beam metrology. With a total of two patents to his name, Goodstein's work focuses on enhancing the precision and efficiency of scanning electron microscopes.
Latest Patents
Goodstein's latest patents include:
1. **Method and apparatus for accurate e-beam metrology** - This patent describes a method involving a scanning electron microscope where a substrate with a target feature is examined. The electron beam scans over the target, and scattered electrons are detected to measure characteristics of the target feature. The method accounts for substrate charging effects by optimizing parameters in a mathematical model and employs principal component analysis to improve processing time and computational speed.
2. **Calibration of a scanning electron microscope** - This patent addresses the calibration process for local charging effects on the critical dimension (CD) of a wafer. The calibration process relies on measuring a calibration wafer with a known CD, allowing the microscope to apply scale factors based on local landing energy (LLE) ratios. This approach corrects measurements for enhanced accuracy in the evaluation of wafers.
Career Highlights
David Goodstein has an impressive career marked by his work at leading companies such as KLA-Tencor Corporation and KLA-Tencor Technologies Corporation. His contributions to these organizations have focused on advancing technology within the field of metrology, specifically through innovations in scanning electron microscopy.
Collaborations
Throughout his career, Goodstein has collaborated with notable professionals, including coworkers Jason C. Yee and Laurence S. Hordon. These partnerships have likely played a crucial role in furthering the innovations that define his work.
Conclusion
David Goodstein stands out as a notable inventor in the realm of electron beam metrology. His patented inventions not only reflect his expertise but also contribute significantly to the field of precision measurement technology. As advancements continue, the impact of Goodstein's work on the future of metrology will undoubtedly be felt.